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Ships within 48 hours · Estimated delivery Jul 26 - Jul 31
Processor: Equipped with an Intel Xeon E5-2600 v4 family processor for powerful performance
Gross Weight: 2 kg
suitable for harsh environments
Connection Type: 1 × RJ45 connector
AMAT 0041-75950 Cchemical Vapor Deposition Reactor REG670 Processor: Equipped with an IntelDescription The AMAT 0041 75950 is a Chemical Vapor Deposition (CVD) reactor, designed as a temperature controlled heating or cooling reactor for thin film deposition. It is used to deposit conformal and uniform films on various substrates. The reactor consists of a reaction chamber enclosed in a vacuum sealed container, allowing precise thermal control and efficient material transfer. This equipment operates within a temperature range from room
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